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Mapper[1] did this, tried to commercialize it and went bankrupt in 2018 and ASML scooped up the remains[2].

[1] https://nl.wikipedia.org/wiki/Mapper_Lithography (no English page available)

[2] https://www.asml.com/en/news/press-releases/2019/asml-agrees...

Doesn’t necessarily make it a bad idea to try again. It seems that photolithography as a process is stretched to its limits. Easy to see the diminishing returns. The electron beam lithography is a different kind of process. It seems like it’s precise enough, just slow. That sounds like good news to me. “Make it go faster” is something we typically can achieve.

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