TSMC has continued to improve the process, and we've seen Apple and AMD design performant and efficient chips as the process improves.
What changes if you don't understand the exact measurements involved?
The actual visible effect of this is an economic one: we've gone from spending linearly more marginal CapEx per fab process-node upgrade, to spending geometrically more marginal CapEx. Each process node under 8nm has been twice as costly to design as the one before it. This is untenable.
It makes no sense to speak about a transistor that would be smaller than the gate, there is no such thing.
Besides the active part, whose conductance is controlled and variable, the transistor includes parts that are either electrical conductors, like the source , the drain and the gate electrode, or electrical insulators.
While those parts may be less important than the active part, they also have a major influence on the transistor characteristics, by introducing various resistances and capacitances in the equivalent schematic.
What matters is always the complete transistor. The only dimensions in a current transistor that are around 1 nm are vertical dimensions, in the direction perpendicular on the semiconductor, e.g. the thickness of the gate insulator.
The 2D semiconductors that are proposed for the TSMC "1 nm" process are substances that have a structure made of 2D sheets of atoms, like graphite, but which are semiconductors, unlike graphite, which is a 2D electrical conductor.
In this case the thickness of the semiconductor can be reduced to single layer of atoms, which is not possible with semiconductors that are 3D crystals, like silicon, because when they no longer form a complete crystal their electrical properties change a lot and they can become conductors or insulators, instead of remaining semiconductors.
There is little doubt that for reducing the transistor dimensions more than it is possible with a 3D semiconductor like silicon, at some point a transition to 2D semiconductors will be necessary. It remains to be seen when that will be possible at an acceptable cost and whether such smaller transistors can improve the overall performance of a device, because making smaller transistors makes sense only when that allows a smaller price, smaller volume or higher performance of a complete product.
They never state it was the actual gate size in the first place. May be you should blame the media for it?
And just to reply to parents.
> TSMC does sometimes call the nodes eg "N7" now.
It is not sometimes. TSMC has always been very careful and calling it N7 or N10 all the way back to 28nm era. What the media, marketing and other PR decided to call it are entirely different matter. This is especially problematic since ~2015 when they have gotten thousands if not millions times more media coverage.
Analysts are often not from the exact line of business. They may have a bachelor's in engineering, or something, but they're usually not domain experts beyond having studied the field from a business perspective and gotten used to its lingo. So, these things can be kind of manipulative. That said, it's par for the course. It's better than outright lying and bribing the analysts like in the 2000-2002 telecom bust.
This is such a HN issue. It's not tricking people because the vast majority of layman don't even care about node size, gate size or the manufacturing process. The number of times I have encountered a person outside of a tech bubble that cared about the manufacturing process of a CPU is exactly zero.
What people do care about: does it work, is it fast, is it efficient and can I afford it. At least for performance and efficiency the marketing term does give a somewhat reliable indication of the generational gains.