If I recall properly, and if I trust what I read/viewed from the internet ages ago, EUV optics is from Germany (zeiss), and the EUV light is from cymer. cymer almost lost their part because they had been unable to deliver enough EUV light power for too long (in the end, it seems they shine their massive CO2 laser on a tin droplet, 2 times instead of one and yield enough power). mask/wafer alignment equipment, dunno where they are from (nanometric piezo-electric motors, with probably laser interferometer). Then, at the time everything was run in extreme vaccum, but heard something about hydrogen gas.

From what I read regarding the current block, USA couldn't force ASML under current US law, because ASML uses less than 25% US technology.

But USA didn't have to force them. ASML's EUV tech started out as a US funded venture, so I don't think they want to start a fight with USA.

And USA could obviously change its laws to block sales of technology even if less than 25% of the end product is from USA.