I can highly recommend [0] for some reading on how simple optics can be if you can optimize aspherics for a fixed focus. Just to state the obvious: two identical infinity-focused objectives can be placed with the infinity-corrected sides looking straight towards another, for a physically long 1:1 macro "lens".
I wonder if there is a decent topology for a decently-high-NA reflective objective in the 1:1 to 1:10 (object:sensor) magnification range. And also whether some of those topologies would cope with a (sensor-sized) reflective spatial light modulator (LCoS/DLP would seem most practically relevant) in place of the sensor.
I still get that mouth-watering imagination when thinking about direct digital (maskless) photolithography, as the flexibility is enormous, especially regarding rapid prototyping of highly integrated circuits (350 nm is the limit for single-patterning using aluminium-coated MEMS modulators (aka TI's DLP technology), due to the UV reflectivity drop below 400 nm and thermal limits of the MEMS device).
But I'd probably look at a Zeiss Planar style design.
In general, a 3/5-element design (achromat/apochromat) should do the trick I think, provided you have access to arbitrary aspherics. And in case you can accept a shift in focal length with wavelength (like monochromatic photolithography would), a single symmetric element should be up to the task, unless I'm missing something.
This would just be 4 normal lenses, afaik. And you should be able to reach around 100 mm image circle I guess with the low NA you get away with at that relatively low resolution.