This is a huge detail that further complicates the picture, ASML's lithography technology heavily benefitted from United States DOE research:

> In 1997, ASML began studying a shift to using extreme ultraviolet. Two years later, it joined a consortium, which included Intel and two other U.S. chipmakers, in order to exploit fundamental research conducted by the US Department of Energy. Because the Cooperative Research and Development Agreement (CRADA) it operates under is funded by the US government, licensing must be approved by Congress.