It is actually relatively easy to make a lithography machine that can etch features beyond what EUV can do. You simply use an electron scanning beam rather than photons.

It's what the industry uses to create the masks used in lithography machines, but it could just as easily be used to make the actual chip. The problem is that it doesn't scale, at all. A scanning process is way too slow to be useful in mass production.

Thus you should always be skeptical when someone says they've built a machine that beats ASML's machines, because that's actually the easy part. The hard part is scaling it up.