For the Dutch to allow ASML to ignore those patents would create a technology economic war between the US and EU.
I guess ASML could try and invent a different way to generate the EUV, but nobody has don't that yet - it is an extremely difficult problem (and took many years to find one solution). If those patents are the crux of US control, then presumably ASML will be researching alternatives (citations?).
China has different solutions (in particular China can ignore US patents).
From Wikipedia:
To address the challenge of EUV lithography, researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA) with the invention and rights wholly owned by the US governmentApparently China is developing its own EUV source.
It would be ironic if ASML licenced new tech from China eh?
Of course it's quite possible that any new Chinese techniques have some relevant patents - the video says that other EUV generation techniques were investigated in Japan and Europe.
And the leading-edge fabs are dependent on suppliers other than just ASML: some of these suppliers are US companies that sell very-expensive software.