That's good, but at ~7nm production it is still a bit away from what ASML can do already. ASML's High-NA EUV technology is capable of pushing semiconductor manufacturing below 2nm, potentially reaching 1.4nm or even 1.0nm in the future. Their current low-NA EUV machines (like the NXE:3600D and NXE:3800E) are used for 3nm and 5nm production.
Note: there might be a better source, just got this from a friend and after typing "China" and "euv" in the search bar, I didn't find anything.
Never underestimate the innovation drive created by necessity.
EUV Tool = interferometer machine for calibrating EUV optics.