This is false.
This is false.
> To address the challenge of EUV lithography, researchers at Lawrence Livermore National Laboratory, Lawrence Berkeley National Laboratory, and Sandia National Laboratories were funded in the 1990s to perform basic research into the technical obstacles. The results of this successful effort were disseminated via a public/private partnership Cooperative R&D Agreement (CRADA) with the invention and rights wholly owned by the US government, but licensed and distributed under approval by DOE and Congress.[3] The CRADA consisted of a consortium of private companies and the Labs, manifested as an entity called the Extreme Ultraviolet Limited Liability Company (EUV LLC).[4]
> In 2001 SVG was acquired by ASML, leaving ASML as the sole benefactor of the critical technology.
Unless the situation has changed, the IP is still owned by the US government, and is licensed to ASML through their acquisition of Silicon Valley Group.
"By 2018, ASML succeeded in deploying the intellectual property from the EUV-LLC after several decades of developmental research, with incorporation of European-funded EUCLIDES (Extreme UV Concept Lithography Development System) and long-standing partner German optics manufacturer ZEISS and synchrotron light source supplier Oxford Instruments..."
That explicitly says that the IP is with EUV-LLC (edit: which is of U.S. origin).
"The CRADA consisted of a consortium of private companies and the Labs, manifested as an entity called the Extreme Ultraviolet Limited Liability Company (EUV LLC)."
Again, your first quote explicitly states that EUV-LLC was American. The second quote refers to the "Labs", which in this case were the Lawrence Livermore, Sandia, and Berkeley National Laboratories.
Apple may have developed the M4 from the ground up but they still licensed the ISA from ARM.
"To access EUV technology, Intel in 1997 formed the EUV LLC, which entered into a cooperative R&D agreement (CRADA) with DOE. As part of this agreement, Intel and its partners would pay $250 million over three years to cover the direct salary costs of government researchers at the national labs and acquire equipment and materials for the labs, as well as cover the costs of its own researchers dedicated to the project. In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use. At the time, it was the largest CRADA ever undertaken."
In return, the consortium would have exclusive rights to the technology in the EUV lithography field of use