>Hynix reported at the 2009 EUV Symposium that the wall plug efficiency was ~0.02% for EUV, i.e., to get 200-watts at intermediate focus for 100 wafers-per-hour, one would require 1-megawatt of input power
https://en.wikipedia.org/wiki/Extreme_ultraviolet_lithograph...
It's an damn good question of how much further this can scale. EUV photons are a lot more like x-rays than they are visible light. They're energetic enough now they're inflicting ionization effects on photoresist material, blurring the exposed area with secondary electron scatter. The fundamental limit of electronic transistors, ones made out of single molecules, are going to be tough to make with lithography.