At 3nm, you get smaller than a biological protein and have features with countable numbers of atoms. And as far as my education went, quantum effects start to dominate, and bulk material properties start to (mis)behave very differently.
At 3nm, you get smaller than a biological protein and have features with countable numbers of atoms. And as far as my education went, quantum effects start to dominate, and bulk material properties start to (mis)behave very differently.
It's fucking amazing to think that such microscopic features are repeatably produced at all, let alone at the scale of modern semiconductor fabrication. They can deposit layers of material measured in atoms. As in, 'Now I want a layer of copper 4 atoms thick' [1].
This table shows the actual measurements of the features of a device for each node:
http://semiengineering.com/wp-content/uploads/2014/05/Screen...
[0] https://upload.wikimedia.org/wikipedia/commons/b/bb/Doublega...
Also worth noting, intel's 14nm is significantly smaller than samsung's 14nm: https://forums.anandtech.com/threads/how-do-global-foundries...
So I don't think the answer is really that simple and straight-forward.
EDIT: I was wrong, Samsung is manufacturing commercially available SoCs on its "10nm" process. But in my defense, it's comparable to Intel's 14nm process.
Will it be possible to fab a CPU at this density, or just memory devices? With memory, you can use error correction to compensate for faults. That's hard to do in logic. (Not impossible; it's been done, with CPUs that have self-checking. IBM has done that in their mainframe CPUs.)
But ya, I mean if you forced them to, their engineers could probably produce the formula that mixes together a bunch of actual physical feature sizes, and explain why 3nm is not a lie - but its very much a marketing thing.
One obvious hint at this is how the different manufacturer's 'x' nm nodes have obviously different performances.
http://blog.cdrom2go.com/2011/02/can-a-cd-rom-disc-explode-i...
You can do it, but it takes some effort. CDs don't typically suffer structural failure at normal operation speeds...
https://www.nature.com/nnano/journal/v7/n7/full/nnano.2012.9...
Working on an areal density works better in an era where improvements are going closer to linear.
Additionally, the number of defects is proportional to the area. The bigger your chip, the more chips you will have to throw away because of defects. E.g. say you have one defect per wafer on average, if your chip takes up the whole wafer, you will have no good chips. If you can fit 100 chips on one wafer, you will have 99 good ones and one bad one.
you also don't need to double the die size just double the size of the package (what AMD seem to have done), that way you can swap broken dies out.
AMD are shipping multi-chip modules with ThreadRipper (with two die) and EPYC (with four), and then because they are separate die you can trivially swap them out.
I think the number of transitors per unit area would be better. Though advanced applications mess with transistor sizes too, the situation would be better than gates.
Today we are @ ~ 14, 16 nm.
When we get to 7nm, the today's chip that is using 1 cm^2 size silicon can probably be build with 0.25 cm^2 size silicon die. (IO pads are another factor).
If "everything (mainly yield?) being equal ", they should be able build 4x amount of chips from the same silicon wafer. Again, assuming IO is not an issue.
If the process cost, yield is similar, the new chips "can be" 4x cheaper OR they can pack 4 times # of transistors into the same 1 cm^2 area. It can means more CPU, GPU cores, much larger L1, L2, L3 cache for the same chip size.
When we get to 3 nm, they can build 16x amount of chips from the same 12 inch wafer.
Or pack 16x amount of transistors into the same silicon area.A good example is:
* Apple A10: https://en.wikipedia.org/wiki/Apple_A10
16 nm: die area of 125 mm2, 3.3 billion
* Apple A11: https://en.wikipedia.org/wiki/Apple_A11
10 nm: 4.3 billion transistors[6] on a die 87.66 mm2
Small die = more chips per wafer. More transistors = More CPU cores, GPU cores, etc.So nm is definitively has REAL impact on cost of a chip and amount of features (transistors) one can pack into a silicon die. It is not a simple marketing term.
Today we are @ ~ 14, 16 nm.
When we get to 7nm, the today's chip that is using 1 cm^2 size silicon can probably be build with 0.25 cm^2 size silicon die. (IO pads are another factor).
If "everything (mainly yield?) being equal ", they should be able build 4x amount of chips from the same silicon wafer. Again, assuming IO is not an issue.
If the process cost, yield is similar, the new chips "can be" 4x cheaper OR they can pack 4 times # of transistors into the same 1 cm^2 area. It can means more CPU, GPU cores, much larger L1, L2, L3 cache for the same chip size.
When we get to 3 nm, they can build 16x amount of chips from the same 12 inch wafer.
That's only if they are not up against pad-limited die size. Long ago people were running up against the issue of pad-limited die size, where the size of the I/O ring set the die size while the core logic ended up using less than all the available area. People were trying to figure out what extra stuff to throw into the core since it was shrinking so fast and the I/O was not. That was usually more memory, but that wasn't always useful.
So what's happening on that front these days? Are the current architectures actually able to make use of many more cores and memory without blowing up the I/O count of the chip?
Just as a comparison, the Bohr radius of an doping election in a silicon crystal is around 10nm. I don't think you will see 3nm wide transistors unless they are fin-fets.
That's a 3nm process. You might get away with putting to 9nm lines within 3nm of each other, or you might come up with some interesting transistor shapes that would not be possible on a larger process. But a trace would still have to be 9nm.